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Sputtering Targets

Stock No.
NS6130-10-1030
CAS
7440-36-0
MSDS
MSDS-PDF
Specifications
SPEC-PDF
COA
COA-PDF
Catalogue
MSDS pdf

Antimony Sputtering Target

(Sb, Purity: 99.99%, Dia: 50.8mm)
Antimony Sputtering Target
Available Pack Size: 1Pc, 2Pcs, 5Pcs, 10Pcs & Bulk orders
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Antimony Sputtering Target
ProductAntimony Sputtering Target
Stock NoNS6130-10-1030
CAS7440-36-0Confirm
Purity 99.99%Confirm
Diameter 50.8 mm ± 1mmConfirm
Thickness 3 mm ± 0.5mmConfirm
Shape RoundConfirm
Backing Plate Copper (as per customer requirement)
Size and Shape Targets Diameter and thickness can be according to Customer Requirement
ConclusionThe specifications Confirm with enterprise standard
Quality ControlEach Lot of was tested successfully
Main Inspect VerifierManager QC

Typical Chemical Analysis

Assay99.99%

Expert Reviews

product-expert-image
Dr. Jochen Maier Ph.D (Canterbury Christ Church University, New Zealand)

Antimony Sputtering Target is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas.

product-expert-image
Dr. Ms. Suvi Ellilä Ph.D (Halmstad University department of Research & technology, Sweden)

High-purity metals for the best results We have the flexibility to produce Antimony Sputtering Target in shapes and sizes, and we never compromise in the purity of our raw materials. Our finished and semi-finished targets and our anodes are all made from the very highest purity of different metals.

product-expert-image
Dr. Patrick Nilssen (Northern Private University Olivos, Peru)

Particulate contamination of thin films is a concern in many industries, including semiconductor manufacturing. Particulates are formed either in the gas phase of the plasma or by flaking off deposited films from wall surfaces. They then become negatively charged and electrostatically trapped in a plasma, where they can increase in size. When the plasma is turned off, or even sooner than that, they can fall onto or be transported otherwise to the substrate. With 0.18 mm feature sizes on a semiconductor wafer, a particle of diameter of 90 nm may result in a killer defect. Particles of this size, and some much larger, are known to grow in plasma processing discharges, including sputtering sources.

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Antimony Sputtering Target

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From us, you can easily purchase Antimony Sputtering Target (Sb, Purity: 99.99%, Dia: 50.8mm) at great prices. Place online order and we will dispatch your order through DHL, FedEx, UPS. You can also request for a quote by mailing us at sales@nanoshel.com. We invite you to contact us for further information about our company and our capabilities. At Nanoshel, we could be glad to be of service to you. We look forward to your suggestions and feedback.
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Antimony Sputtering Target (Sb, Purity: 99.99%, Dia: 50.8mm)

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