Home » Boron Sputtering Target (Bo, Purity: 99.99%)

SPUTTERING TARGETS

Stock No. CAS MSDS Specification COA
NS6130-10-1130 7440-42-8 MSDS pdf Specification pdf COA pdf

Boron Sputtering Target (Bo, Purity: 99.99%)

Boron Sputtering Target

Boron Sputtering Target (Bo, Purity: 99.99%)

Quality Control: Each lot of Boron Sputtering Target was tested successfully.

Boron Sputtering Target

Boron Sputtering Target

 
Product Boron Sputtering Target
Stock No NS6130-10-1130
CAS 7440-42-8 Confirm
Purity 99.99% Confirm
Density 2.08 g/cm³ Confirm
Molecular Weight 10.81 g/mol Confirm
Melting Point 2076 °C Confirm
Diameter 50 mm ± 1mm Confirm
Thickness 3 mm ± 0.5mm Confirm
Shape Round Confirm
Size and Shape Targets Diameter and thickness can be according to Customer Requirement
Backing Plate Copper (as per customer requirement)
Conclusion The specifications Confirm with enterprise standard
Main Inspect Verifier Manager QC

Typical Chemical Analysis

Bo 99.99%

Expert Reviews

Dr. Jochen Maier, Ph.D (Canterbury Christ Church University, New Zealand)

Boron Sputtering Target is a non-metallic element which occurs in several allotropes. It is rarely found in nature, normally occurring as borates or orthoboric acid (the abundance of boron in the earth's crust is 10 ppm, the principal ore being borax, Na2B4O7.xH2O). Amorphous boron is the more common allotrope and exists as a dark powder which is unreactive towards water, oxygen, acids and alkalis. Boron finds importance within nuclear reactors due to its neutron absorbing capabilities, boron steel being used as control rod material. Boron compounds are used for a number of applications including the manufacture of certain grades of glass and detergents.


Dr. Ms. Suvi Ellilä, Ph.D (Halmstad University department of Research & technology, Sweden)

Boron Sputtering Target will react directly with most metals to produce metal borides which are hard, inert binary compounds of various formulae and arrangements of the boron atoms. For example, as single atoms (M2B), pairs (M3B2), single and double chains (MB, M3B4), sheets (MB2), B6 octahedra (MB6) and B12 clusters (MB12). Boron also forms the binary compound, boron nitride, which is of interest as it is isoelectronic with carbon and occurs in two structural modifications; one is a layer structure similar to graphite which is soft and lubricating, whilst the other (formed under high pressure) has a very hard, stable, tetrahedral structure as found in diamond.


Dr. Patrick Nilssen, (Northern Private University Olivos, Peru)

Boron Sputtering Target, Boron Carbide and metal borides, because of their extreme hardness and abrasiveness, are used in the manufacture of specialty saw blades and abrasive wheels. Both have very high melting points: 3350°C and 3000°C, respectively. Due to its high hardness, boron carbide powder is used as an abrasive in polishing and lapping applications, and also as a loose abrasive in cutting applications such as water jet cutting. It can also be used for dressing diamond tools.


Boron Sputtering Target

Boron Sputtering Target