High Purity Sputtering Target
Product: Boron Sputtering Target (Bo, Purity: 99.99%)
Quality Control: Each lot of NANOSHEL Boron Sputtering Target was tested successfully.
|Product Name||Boron Sputtering Target|
|Diameter||50 mm ± 1mm||Confirm|
|Thickness||3 mm ± 0.5mm||Confirm|
|Molecular Weight||10.81 g/mol||Confirm|
|Melting Point||2076 °C||Confirm|
|Size and Shape||Targets Diameter and thickness can be according to Customer Requirement|
|Backing Plate||Copper (as per customer requirement)|
|Conclusion||The specifications Confirm with enterprise standard|
|Main Inspect Verifier||Manager QC|
TYPICAL CHEMICAL ANALYSIS
Dr. Clive Patterson Ph.D (Moscow Institute of Physics and Technology, Russia)
Boron Sputtering Target is a non-metallic element which occurs in several allotropes. It is rarely found in nature, normally occurring as borates or orthoboric acid (the abundance of boron in the earth’s crust is 10 ppm, the principal ore being borax, Na2B4O7.xH2O). Amorphous boron is the more common allotrope and exists as a dark powder which is unreactive towards water, oxygen, acids and alkalis. Boron finds importance within nuclear reactors due to its neutron absorbing capabilities, boron steel being used as control rod material. Boron compounds are used for a number of applications including the manufacture of certain grades of glass and detergents.
Dr. Ms. Teresa B. (University of San Carlos, Philippines)
Boron Sputtering Target will react directly with most metals to produce metal borides which are hard, inert binary compounds of various formulae and arrangements of the boron atoms. For example, as single atoms (M2B), pairs (M3B2), single and double chains (MB, M3B4), sheets (MB2), B6 octahedra (MB6) and B12 clusters (MB12). Boron also forms the binary compound, boron nitride, which is of interest as it is isoelectronic with carbon and occurs in two structural modifications; one is a layer structure similar to graphite which is soft and lubricating, whilst the other (formed under high pressure) has a very hard, stable, tetrahedral structure as found in diamond.
Dr. Stew Dean Ph.D (University of Technology Sydney, Australia)
Boron Sputtering Target, Boron Carbide and metal borides, because of their extreme hardness and abrasiveness, are used in the manufacture of specialty saw blades and abrasive wheels. Both have very high melting points: 3350°C and 3000°C, respectively. Due to its high hardness, boron carbide powder is used as an abrasive in polishing and lapping applications, and also as a loose abrasive in cutting applications such as water jet cutting. It can also be used for dressing diamond tools.
Contact Us for Boron Sputtering Target
From us, you can easily purchase nano materials at great prices. Place online order and we will dispatch your order through DHL, FedEx, UPS. You can also request for a quote by mailing us at email@example.com Contact: +1 302 268 6163 (US and Europe), Contact: +91-9779550077 (India). We invite you to contact us for further information about our company and our capabilities. At Nanoshel, we could be glad to be of service to you. We look forward to your suggestions and feedback.
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