Home » Carbon Sputtering Target (C, Purity: 99.99%)


Stock No. CAS MSDS Specification COA
NS6130-10-1150 7440-44-0 MSDS pdf Specification pdf COA pdf

Carbon Sputtering Target

Carbon Sputtering Target (C, Purity: 99.99%)


Carbon Sputtering Target

Carbon Sputtering Target

Product Carbon Sputtering Target
Stock No NS6130-10-1150
CAS 7440-44-0 Confirm
Purity 99.99% Confirm
Diameter 50 mm ± 1mm Confirm
Thickness 3 mm ± 0.5mm Confirm
Density 1.8 – 2.1 g/cm³ Confirm
Shape Round Confirm
Backing Plate Copper (as per customer requirement)
Size and Shape Targets Diameter and thickness can be according to Customer Requirement
Conclusion The specifications Confirm with enterprise standard
Quality Control Each lot of Carbon Sputtering Target was tested successfully.
Main Inspect Verifier Manager QC

Typical Chemical Analysis

Assay 99.99%

Expert Reviews

Dr. Jochen Maier, Ph.D (Canterbury Christ Church University, New Zealand)

Carbon targets used for sputtering of carbon films generally consist of nearly pure graphite. The targets are electrically conductive. The target materials are readily available from many vendors world wide.

Dr. Ms. Suvi Ellilä, Ph.D (Halmstad University department of Research & technology, Sweden)

Carbon sputtering target was replaced after the de- positions of 20-30 films with several thousand A in thickness in mass-separated negative ion beam deposition system. Carbon films can also be deposited by magnetron sputtering in which a magnetically confined plasma torus  acts as a distributed source of ions that impact a carbon sputtering target over a significant part of its area. C -ions were produced from a highly pure carbon-sputtering target by cesium ion sputtering in a neutral and ionized alkaline bombardment-type heavy negative ion source.

Dr. Patrick Nilssen, (Northern Private University Olivos, Peru)

The applications for carbon are many and include its use as an alloying element with iron in the manufacture of steel, its use as brushes in electrical generators and motors, the use of colloidal graphite or carbon to coat surfaces (e.g. glass), in electrical assemblies to absorb microwaves and inhibit photoelectrons and secondary electrons, and the use of high purity carbon (graphite) in nuclear reactors to moderate neutrons.

carbon sputtering target

carbon sputtering target

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