Carbon Sputtering Target (C, Purity: 99.99%)

High Purity Sputtering Target

Product: Carbon Sputtering Target (C, Purity: 99.99%)

Quality Control: Each lot of NANOSHEL Carbon Sputtering Target was tested successfully.

C Sputtering Target Image

Carbon – Sputtering Target

Product Name Carbon Sputtering Target
Product Code NS6130-10-1150
CAS 7440-44-0 Confirm
Diameter 50 mm ± 1mm Confirm
Thickness 3 mm ± 0.5mm Confirm
Purity >99.99% Confirm
Density 1.8 – 2.1 g/cm³ Confirm
Shape Round Confirm
Size and Shape Targets Diameter and thickness can be according to Customer Requirement
Backing Plate Copper (as per customer requirement)
Conclusion The specifications Confirm with enterprise standard
Main Inspect Verifier Manager QC

TYPICAL CHEMICAL ANALYSIS

Carbon 99.9 % Confirm

Experts Review:


Dr. Clive Patterson Ph.D (Moscow Institute of Physics and Technology, Russia)
Carbon targets
used for sputtering of carbon films generally consist of nearly pure graphite. The targets are electrically conductive. The target materials are readily available from many vendors world wide.


Dr. Ms. Teresa B. (University of San Carlos, Philippines)
Carbon sputtering target
was replaced after the de- positions of 20-30 films with several thousand A in thickness in mass-separated negative ion beam deposition system. Carbon films can also be deposited by magnetron sputtering in which a magnetically confined plasma torus  acts as a distributed source of ions that impact a carbon sputtering target over a significant part of its area. C -ions were produced from a highly pure carbon-sputtering target by cesium ion sputtering in a neutral and ionized alkaline bombardment-type heavy negative ion source.


Dr. Stew Dean Ph.D (University of Technology Sydney, Australia)
The applications for carbon are many and include its use as an alloying element with iron in the manufacture of steel, its use as brushes in electrical generators and motors, the use of colloidal graphite or carbon to coat surfaces (e.g. glass), in electrical assemblies to absorb microwaves and inhibit photoelectrons and secondary electrons, and the use of high purity carbon (graphite) in nuclear reactors to moderate neutrons.


carbon sputtering target

carbon sputtering target

 

free quote

Contact Us for Carbon Sputtering Target
From us, you can easily purchase nano materials at great prices. Place online order and we will dispatch your order through DHL, FedEx, UPS. You can also request for a quote by mailing us at sales@nanoshel.com Contact: +1 302 268 6163 (US and Europe), Contact: +91-9779550077 (India). We invite you to contact us for further information about our company and our capabilities. At Nanoshel, we could be glad to be of service to you. We look forward to your suggestions and feedback.


More Sputtering Targets By Nanoshel

NS6130-10-1144 – Ytterbium Fluoride Sputtering Target (YbF3, Purity: 99.99%)

NS6130-10-1145 – Zinc Selenide Sputtering Target (ZnSe, Purity: 99.99%)

NS6130-10-1149 – Stainless Steel Sputtering Target (SS, Purity: 99.99%)

NS6130-10-1150 – Carbon Sputtering Target (C, Purity: 99.99%)

NS6130-10-1151 – Silver Sputtering Target (Ag, Purity: 99.99%)

NS6130-10-1153 – Hafnium Oxide Sputtering Target (HfO2, Purity: 99.99%)

NS6130-10-1154 – Hafnium Aluminium Oxide Sputtering Target (HfAlO2, Purity: 99.99%)

NS6130-10-1155 – Cobalt Sputtering Target (Baked With Indium Bonded, Purity: 99.99%)

NS6130-10-1161 – Gold Tin Sputtering Target (Au:Sn, Purity: 99.99%)

NS6130-10-1176 – Erbium Sputtering Target (Er, Purity: 99.99%)