Ceramic Substrate

High Purity Substrate

Product: Ceramic Substrate (Purity: 99.5%)

Quality Control: Each lot of NANOSHEL Ceramic Substrate was tested successfully.

Product Name Ceramic Substrate
Product Code NS6130-10-1102 Confirm
Purity >99.5% Confirm
Density 3.95g/cm³ Confirm
Porosity 0-.05% Confirm
Flexural Strength 50.0-55.0 kpsi Confirm
Comprehensive Strength > 300.0 kpsi Confirm
Tensile Strength 20.0-28.0 kpsi Confirm
Linear Coefficient of Thermal Expansion 7.5X10-6 (cm/cm/°C) Confirm
Dielectric Constant at 25°C 9.5-9.9 1 MH Confirm
Dielectric Strength 225 Volt/mil Confirm
Thermal Conductivity at 25°C .07-.08 cal/sec/cm2/cm/°C Confirm
Thermal Shock Good Confirm
Safe Use Temperature 1800 °C Confirm
General Application Extremely High Purity, Temperature & Strength Excellent Corrosion & Wear Resistance
Main Inspect Verifier Manager QC

Experts Review:


Dr. Clive Patterson Ph.D (Moscow Institute of Physics and Technology, Russia)
Ceramic substrate has the advantages of high wear-resisting,electric insulation,resistant acid-base, high intensity,high temperature tolerance, high strength , precision process, high mechanical strength, good chemical stability, polishing surface and so on.


Dr. Ms. Teresa B. (University of San Carlos, Philippines)
High-purity metals for the best results We have the flexibility to produce targets in shapes and sizes, and we never compromise in the purity of our raw materials. Our finished and semi-finished targets and our anodes are all made from the very highest purity of different metals.


Dr. Stew Dean Ph.D (University of Technology Sydney, Australia)
Particulate contamination of thin films is a concern in many industries, including semiconductor manufacturing. Particulates are formed either in the gas phase of the plasma or by flaking off deposited films from wall surfaces. They then become negatively charged and electrostatically trapped in a plasma, where they can increase in size. When the plasma is turned off, or even sooner than that, they can fall onto or be transported otherwise to the substrate. With 0.18 mm feature sizes on a semiconductor wafer, a particle of diameter of 90 nm may result in a killer defect. Particles of this size, and some much larger, are known to grow in plasma processing discharges, including sputtering sources.


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Ceramic Substrate



Nanoshel’s Product Categories Link:

ZnSe/ZnS QDs WATER SOLUBLE, InP ZnS QDs SURFACE MODIFIED, CdS/ZnS QDs H2O SOLUBLE, PbS QDs SURFACE MODIFIED, ARSENIDES, LANTHANIDE NANOMATERIALS, TRANSITION METAL NANOMATERIALS, SPECIALITY CHEMICALS, MAGNETIC NANOPARTICLES, CUSTOM SYENTHESIS, METALIC FOAMS, SCREEN PRINTED BIO SENSOR, LITHIUM ION BATTERY MATERIAL, ITO COATED GLASS, POLYMERS NANO MATERIAL, NANO FABRIC COATINGS, METAL FOILS, PELLETS CHIPS METAL BALLS, WAFERS & TARGETS, SPUTTERING TARGETS, SINGLE CRYSTAL SUBSTRATES, PYROLITIC GRAPHITE, PROTECTIVE EQUIPMENTS, METAL CRUCIBLES, ALUMINA CERAMIC TILES, INORGANIC COMPOUNDS