Product | Cerium Oxide Glass Polishing Powder | |
Stock No | NS6130-05-546 | |
CAS | 1306-38-3 | Confirm |
Purity | 99% | Confirm |
APS | 60-70µm | Confirm |
Molecular Formula | CeO2 | Confirm |
Molecular Weight | 172.114 g/mol | Confirm |
Form | Powder | Confirm |
Color | White | Confirm |
Melting Point | 2,400 °C | Confirm |
Boiling Point | 3,500 °C | Confirm |
Quality Control | Each Lot of cerium oxide glass polishing powder was tested successfully | |
Main Inspect Verifier | Manager QC |
Typical Chemical Analysis
Assay | 99% |
Cerium (IV) oxide, also known with different names such as ceric oxide, ceric dioxide, ceria, cerium oxide or cerium dioxide. It is an oxide of the rare-earth metal cerium and is a pale yellow-white powder with the chemical formula CeO2. It is an indispensable commercial product and an intermediate in the purification of the element from the ores. The distinctive property of cerium oxide material is its reversible conversion to a nonstoichiometric oxide.
Cerium oxide powder is a significant constituent of incandescent gas mantles and is also utilized as a hydrocarbon catalyst in ‘self-cleaning’ ovens. Cerium is an indispensable catalyst in petroleum refining and is used in metallurgical applications, alloys for jet engine components and in carbon arc electrodes.
Cerium oxide powder: Ceria based materials have the capability of achieving remarkably high vacancy concentrations at elevated temperatures and low oxygen partial pressures. To conclude, these materials are attractive as reactive intermediates in thermochemical redox cycles for the production of solar fuels. Cerium is employed as bioactive material that has remarkable properties, for instance, retinal neurodegeneration protection, and anti-inflammatory. Ce is used to protect gastrointestinal ulcers against oxidative stress by dual oxidation states.
Cerium oxide powder: In microelectronics, CeO2 has been considered as high gate oxide material because of its unique properties: moderate bandgap, high dielectric constant, high refractive index and high dielectric strength. CeO2 is also suitable for Si-based metal oxide semiconductor (MOS) devices due to its small lattice mismatch with Si that favors its epitaxial growth on different silicon surfaces and low interface-state.
Cerium oxide powder is utilized for non-volatile memory devices in metal-insulator-metal stacks and for catalytic applications, CeO2 has to be grown on metallic substrates; however, the cerium oxide film is grown on metals and with an ultra-low thickness (mono or few layers) aiming at depicting the epitaxial growth relation.
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Cerium Oxide Glass Polishing Powder (CeO2, Purity: 99%, APS: 60-70µm)