High Purity Sputtering Target
Product: Chromium Sputtering Target (Cr, Purity: 99.99%, Dia: 50±1mm)
Quality Control: Each lot of NANOSHEL Chromium Sputtering Target was tested successfully.
|Product Name||Chromium Sputtering Target|
|Diameter||50 mm ± 1mm||Confirm|
|Thickness||3 mm ± 0.5mm||Confirm|
|Molecular Weight||51.996 g/mol||Confirm|
|Melting Point||1907 °C||Confirm|
|Size and Shape||Targets Diameter and thickness can be according to Customer Requirement|
|Backing Plate||Copper (as per customer requirement)|
|Conclusion||The specifications Confirm with enterprise standard|
|Main Inspect Verifier||Manager QC|
TYPICAL CHEMICAL ANALYSIS
Dr. Clive Patterson Ph.D (Moscow Institute of Physics and Technology, Russia)
Chromium Sputtering Target is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas.
Dr. Ms. Teresa B. (University of San Carlos, Philippines)
Chromium Sputtering Target is a chemical element with symbol Cr and atomic number 24. It is the first element in Group 6. It is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. Chromium metal is of high value for its high corrosion resistance and hardness.
Dr. Stew Dean Ph.D (University of Technology Sydney, Australia)
Chromium Sputtering Target-based coatings have a wear resistance which is between two and a half and five times better than hard chrome plating and do not suffer from effluent disposal problems. They are therefore finding increasing use at the expense of hard chrome plating, particularly if wear resistance is important or if a thick coating is required on a large part. This is an exciting and rapidly growing area which will become more important as the cost of complying with environmental legislation becomes greater.
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