Product | Chromium Sputtering Target | |
Stock No | NS6130-10-1053 | |
CAS | 7440-47-3 | Confirm |
Purity | 99.99% | Confirm |
Diameter | 50.8 mm ± 1mm | Confirm |
Thickness | 3 mm ± 0.5mm | Confirm |
Molecular Weight | 51.996 g/mol | Confirm |
Density | 7.19 g/cm³ | Confirm |
Melting Point | 1907 °C | Confirm |
Shape | Round | Confirm |
Backing Plate | Copper (as per customer requirement) | |
Size and Shape | Targets Diameter and thickness can be according to Customer Requirement | |
Conclusion | The specifications Confirm with enterprise standard | |
Quality Control | Each Lot of Chromium Sputtering Target was tested successfully | |
Main Inspect Verifier | Manager QC |
Typical Chemical Analysis
Assay | 99.99% |
Chromium Sputtering Target is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas.
Chromium Sputtering Target is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas.
Chromium Sputtering Target-based coatings have a wear resistance which is between two and a half and five times better than hard chrome plating and do not suffer from effluent disposal problems. They are therefore finding increasing use at the expense of hard chrome plating, particularly if wear resistance is important or if a thick coating is required on a large part. This is an exciting and rapidly growing area which will become more important as the cost of complying with environmental legislation becomes greater.
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Chromium Sputtering Target (Cr, Purity: 99.99%, Dia: 50.8mm)