Cobalt Chromium Alloy Sputtering Target
Product: Cobalt Chromium Alloy Sputtering Target (Co3Cr, Purity: 99.99%)
Quality Control: Each lot of NANOSHEL Cobalt Chromium Alloy Sputtering Target was tested successfully.
|Product Name||Cobalt Chromium Alloy Sputtering Target|
|Diameter||50 mm ± 1mm||Confirm|
|Thickness||3 mm ± 0.5mm||Confirm|
|Size and Shape||Targets Diameter and thickness can be according to Customer Requirement|
|Backing Plate||Copper (as per customer requirement)|
|Conclusion||The specifications Confirm with enterprise standard|
|Main Inspect Verifier||Manager QC|
TYPICAL CHEMICAL ANALYSIS
Dr. Clive Patterson Ph.D (Moscow Institute of Physics and Technology, Russia)
Cobalt Chromium Alloy Sputtering Target is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas.
Dr. Ms. Teresa B. (University of San Carlos, Philippines)
Cobalt Chromium Alloy Sputtering Target is a chemical element with symbol Cr and atomic number 24. It is the first element in Group 6. It is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. Chromium metal is of high value for its high corrosion resistance and hardness.
Dr. Stew Dean Ph.D (University of Technology Sydney, Australia)
Cobalt Chromium Alloy Sputtering Target are hard and their general use is to provide hard wear-resistant coatings on parts that need to be protected. When combined with a protective metal matrix, corrosion-resistant as well as wear-resistant coatings can be developed that are easy to apply and cost effective. These coatings are applied by either welding or thermal spray. When combined with other carbides, chromium carbide can be used to form cutting tools.
Contact Us for Cobalt Chromium Alloy Sputtering Target
From us, you can easily purchase nano materials at great prices. Place online order and we will dispatch your order through DHL, FedEx, UPS. You can also request for a quote by mailing us at email@example.com Contact: +1 302 268 6163 (US and Europe), Contact: +91-9779550077 (India). We invite you to contact us for further information about our company and our capabilities. At Nanoshel, we could be glad to be of service to you. We look forward to your suggestions and feedback.
More Sputtering Targets By Nanoshel
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NS6130-10-1055 – Copper Sputtering Target (Cu, Purity: 99.99%)
NS6130-10-1056 – Dysprosium Sputtering Target (Dy, Purity: 99.99%)
NS6130-10-1057 – Silicon Oxide Sputtering Target (SiO2, Purity: 99.99%)
NS6130-10-1058 – Silicon Nitride Sputtering Target (Si3N4, Purity: 99.99%)
NS6130-10-1059 – Cobalt Chromium Alloy Sputtering Target (Co3Cr, Purity: 99.99%)
NS6130-10-1060 – Titanium Oxide Sputtering Target (TiO2, Purity: 99.99%)
NS6130-10-1061 – Titanium Aluminium Vanadium Sputtering Target (TiAlV, Purity: 99.99%)
NS6130-10-1130 – Boron Sputtering Target (Bo, Purity: 99.99%)