Home » Cobalt Chromium Alloy Sputtering Target (Co3Cr, Purity: 99.99%)
Cobalt Chromium Alloy Sputtering Target
|Product||Cobalt Chromium Alloy Sputtering Target|
|Diameter||50 mm ± 1mm||Confirm|
|Thickness||3 mm ± 0.5mm||Confirm|
|Backing Plate||Copper (as per customer requirement)|
|Size and Shape||Targets Diameter and thickness can be according to Customer Requirement|
|Conclusion||The specifications Confirm with enterprise standard|
|Quality Control||Each lot of Cobalt Chromium Alloy Sputtering Target was tested successfully.|
|Main Inspect Verifier||Manager QC|
Cobalt Chromium Alloy Sputtering Target is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas.
Cobalt Chromium Alloy Sputtering Target is a chemical element with symbol Cr and atomic number 24. It is the first element in Group 6. It is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. Chromium metal is of high value for its high corrosion resistance and hardness.
Cobalt Chromium Alloy Sputtering Target are hard and their general use is to provide hard wear-resistant coatings on parts that need to be protected. When combined with a protective metal matrix, corrosion-resistant as well as wear-resistant coatings can be developed that are easy to apply and cost effective. These coatings are applied by either welding or thermal spray. When combined with other carbides, chromium carbide can be used to form cutting tools.
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