Sputtering Targets

Cobalt Oxide Sputtering Target is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas.

Cobalt Oxide Sputtering Target metals for the best results We have the flexibility to produce Cobalt Oxide Sputtering Target in shapes and sizes, and we never compromise in the purity of our raw materials. Our finished and semi-finished targets and our anodes are all made from the very highest purity of different metals.

Cobalt Oxide Sputtering Target has a stable hexagonal close-packed crystal structure. At higher temperatures up to the melting point of 1,495 °C (2,723 °F), the stable form is face-centred cubic. The metal has 12 radioactive isotopes, none of which occurs naturally. The best-known is cobalt-60, which has a half-life of 5.3 years and is used in medicine and industry