Platinum Sputtering Target (Pt, Purity: 99.99%)

High Purity Sputtering Target

Product: Platinum Sputtering Target (Pt, Purity: 99.99%)

Quality Control: Each lot of NANOSHEL Platinum Sputtering Target was tested successfully.

Platinum Target

Platinum Sputtering Target

Product Name Platinum Sputtering Target
Product Code NS6130-10-1034
CAS 7440-06-4 Confirm
Diameter 50 mm ± 1mm Confirm
Thickness 3 mm ± 0.5mm Confirm
Purity >99.99% Confirm
Density 21.45 g/cm³ Confirm
Molecular Weight 195.08 g/mol Confirm
Melting Point 1768 °C Confirm
Shape Round Confirm
Size and Shape Targets Diameter and thickness can be according to Customer Requirement
Backing Plate Copper (as per customer requirement)
Conclusion The specifications Confirm with enterprise standard
Main Inspect Verifier Manager QC

Platinum Sputtering Target Composition:

Pt 99.9% Confirm

Experts Review:

maslinDr. Jochen Maier, Ph.D (Canterbury Christ Church University, New Zealand)
Sputtering is a technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas. The gas use for sputtering is inert such as argon. For efficient momentum transfer projectile mass must match target mass, so for sputtering light elements neon is also used and for heavy elements krypton or xenon.

Website-profile-pics-033-3Dr. Ms. Suvi Ellilä, Ph.D (Halmstad University department of Research & technology, Sweden)
Reactive gases are used to sputter compounds. The chemical reaction can occur on the target surface, in-flight or on the substrate depending on the process parameters. The many parameters make sputter deposition a complex process but allow experts a large degree of control over the growth and microstructure of the film.

HermanCainProfilePicDr. Patrick Nilssen (Northern Private University Olivos, Peru)
Most sputtering target materials can be fabricated into a wide range of shapes and sizes. There are some technical limitations to the maximum size for a given single piece construction. In such cases, a multi-segmented target can be produced with the individual segments joined together by butt or beveled joints. Commonly used targets are circular or rectangular, although other shapes including square and triangular.

article-2738491-20EBB6E400000578-840_306x423Dr. Ms. Maryann Hine, Ph.D (Brewerville Institute of Technology,Liberia)
Nowadays applications of sputtering range from semiconductor industry for Thin Film deposition of various materials in integrated circuit processing, to architectural window glass for energy conservation, decorative with familiar gold-coloured hard coating created by Titanium Nitride and hardwearing coatings for tools and consumer goods, to deposition of metals during fabrication of CDs and DVDs.

CaptureDr. Peter Worcester (Murdoch University, Perth, Western Australia)
Sputter Deposition is a method of depositing thin films by sputtering that involves eroding materilas from a “ target” source onto a “substrate” e.g. silicon wafer. Sputtered atoms are ejected into the gas phase but are not in their thermodynamic equilibrium state, and tend to deposit on all surfaces in the vacuum chamber.

Sputtering-Target copy

Platinum Sputtering Target

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Contact Us for Platinum Sputtering Target 
From us, you can easily purchase Platinum Sputtering Target at great prices. Place online order and we will dispatch your order through DHL, FedEx, UPS. You can also request for a quote by mailing us at Contact: +1 302 268 6163 (US and Europe), Contact: +91-9779550077 (India). We invite you to contact us for further information about our company and our capabilities. At Nanoshel, we could be glad to be of service to you. We look forward to your suggestions and feedback.

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NS6130-10-1036 – Boron Nitride Sputtering Target (BN, Purity: 99.99%)

NS6130-10-1037 – Boron Carbide Sputtering Target (B4C, Purity: 99.99%)

NS6130-10-1038 – Bismuth Sputtering Target (Bi, Purity: 99.99%)

NS6130-10-1039 – Calcium Fluoride Sputtering Target (CaF2, Purity: 99.99%)

NS6130-10-1040 – Lead Sputtering Target (Pb, Purity: 99.99%)

NS6130-10-1041 – Manganese Sputtering Target (Mn, Purity: 99.99%)

NS6130-10-1042 – Molybdenum Sputtering Target (Mo, Purity: 99.99%)