Home » Polymethylsilsesquioxane (Purity: 99.9%, APS: 1-3µm)
SILSESQUIOXANE (POSS)
| Stock No. | CAS | MSDS | Specification | COA |
|---|---|---|---|---|
| NS6130-12-000341 | 68554-70-1 |
|
|
|
Polymethylsilsesquioxane
(Purity: 99.9%, APS: 1-3µm)
| Product | Polymethylsilsesquioxane | |
| Stock No | NS6130-12-000341 | |
| CAS | 68554-70-1 | Confirm |
| APS | 1-3μm | Confirm |
| Purity | 99.9% | Confirm |
| Molecular Weight | 7000 - 8000 g/mol | Confirm |
| Appearance | White Powder | Confirm |
| Density | 1.3 g/cm3 | Confirm |
| Melting Point | > 999 °C | Confirm |
| pH | 6.0 – 8.0 | Confirm |
| Refractive Index | 1.42 | Confirm |
| Solvent Stability | Insoluble In Water | |
| Quality Control | Each lot of Polymethylsilsesquioxane was tested successfully. | |
| Main Inspect Verifier | Manager QC | |
Typical Chemical Analysis
| Assay | 99.9% |
| Other Metal | 800ppm |
Expert Reviews
Dr. Ms. Kamiko Chang, Ph.D, (University of Science and Technology Beijing, China)
Polymethylsilsesquioxane: POSS-containing polymer composites depend on the successful incorporation of POSS particles in polymeric matrices. Two approaches have been adopted to incorporate POSS particles into polymer matrices: (i) chemical cross-linking and (ii) physical blending. In the first approach, POSS nanoparticles are bonded covalently with polymer and in the second approach, they are physically blended with polymer by melt mixing or solvent casting methods.
Dr. Nicholaos G. Demas, (Newcastle University School Of Machanical & Systems Engg. UK)
Polymethylsilsesquioxane: POSS are nanostructures with the empirical formula RSiO1.5, where R may be a hydrogen atom or an organic functional group, e.g., alkyl, alkylene, acrylate, hydroxyl or epoxide unit. POSS may be referred to as a silica nanoparticles consisting of a silica cage core, as well as other organic functional groups attached to the corners of the cage. POSS consists of both organic and inorganic matter with an inner core of inorganic silicon and oxygen and an outer layer of organic constituents, which could be either polar or non polar.
Dr. Myron Rubenstein, Ph.D, (Polytechnic University of Turin, Italy)
Polymethylsilsesquioxane: POSS nanoparticles embedded into a polymer increase the strength, modulus, rigidity and reduce the flammability, heat discharge and viscosity of the polymer, while retaining its light weight and ductile features. These enhanced properties allow for a wider range of applications of these nanocomposites, e.g., drug delivery, polymer electrolytes, thermoplastic and thermosetting polymers. Other benefits to POSS include being non-volatile, odorless and overall environmentally friendly. In addition, the ease with which they can be synthesized makes them commercially available. Considering these potential commercial uses and their increased performance over their non-hybrid counterparts, POSS-containing polymer nanocomposites have been widely investigated.
Dr. Ms. Guixin (Susan), Ph.D, (Switzerland-Institute for Inorganic Chemistry, Zurich, Switzerland)
Polymethylsilsesquioxane: POSS combines the rigid cage of C60 with the high functionality of hyper branched polymers .This has helped POSS find some applications. For example in Colorless Polyimide; Polyimide is a transparent, high temperature polymer with a characteristic orange tint. A copolymer of fluoropolyimide and POSS gives a colorless material with increased resistance to etch from atomic oxygen in Low Earth Orbit (important for satellites) or from oxygen plasma. When exposed to strongly oxidizing conditions, the POSS vitrifies to make a protective glassy layer.
Polymethylsilsesquioxane
From us, you can easily purchase Polymethylsilsesquioxane at great prices. Place online order and we will dispatch your order through DHL, FedEx, UPS. You can also request for a quote by mailing us at sales@nanoshel.com. We invite you to contact us for further information about our company and our capabilities. At Nanoshel, we could be glad to be of service to you. We look forward to your suggestions and feedback.
sales@nanoshel.com
cmg@nanoshel.com
sales5@nanoshel.com
USA - Sales/Research:
+1 646 470 4911
UK - Sales/Research:+44 1782 454 144
Ireland - Sales/Research:+354 71 985 3714
India - Sales/Research:+91-9779550077
+91-9779238252
Note *Exchanges of materials/products are not permitted. Nanoshel does not offer refunds. *US Dollar Cheques Not Accepted, Only Bank TT/Credit Cards Accepted
Ask Nanoshel
Please feel free to
send us your
requirement
about our products
search
Search by Product, Stock No and CAS
Jules L. Routbort, (Argonne National Laboratory, Argonne, USA)
Polymethylsilsesquioxane: Polyhedral Oligomeric Silsesquioxanes (POSS) nanostructures have diameters in the range 1–3 nm and, hence, may be considered as the smallest existing silica particles. POSS particles have been classified as having a zero-dimensional, however the ability to create higher dimensional POSS (1, 2 or 3-D scaffolds) through aggregation or crystallization of the these particles within the polymer matrix has also been reported. This ability of POSS to serve as building blocks plays a key role in motivating the study of POSS in polymer matrices.