Home » Stainless Steel Sputtering Target (SS, Purity: 99.99%)
Stainless Steel Sputtering Target
|Product||Stainless Steel Sputtering Target|
|Diameter||50 mm ± 1mm||Confirm|
|Thickness||3 mm ± 0.5mm||Confirm|
|Backing Plate||Copper (as per customer requirement)|
|Size and Shape||Targets Diameter and thickness can be according to Customer Requirement|
|Conclusion||The specifications Confirm with enterprise standard|
|Quality Control||Each lot of Stainless Steel Sputtering Target was tested successfully.|
|Main Inspect Verifier||Manager QC|
Stainless Steel Sputtering Target is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas.
High-purity metals for the best results We have the flexibility to produce targets in shapes and sizes, and we never compromise in the purity of our raw materials. Our finished and semi-finished targets and our anodes are all made from the very highest purity of different metals.
Steels containing more than approximately 10% Cr are defined as stainless materials.stainless steel characterized by very good resistance to general corrosion in sulphuric, phosphoric and acetic acid as well as very good resistance to pitting corrosion and stress corrosion cracking. Good corrosion resistance to most chemicals. High creep strength at elevated temperatures. The low carbon content redices the possibility of in vivo corrosion for medical applications.
Note *Exchanges of materials/products are not permitted. Nanoshel does not offer refunds. *US Dollar Cheques Not Accepted, Only Bank TT/Credit Cards Accepted