Home » Tin Oxide Nanopowder (SnO2, F Doped, 99.9%, 80-100nm)

DOPED NANOPOWDERS

Stock No. CAS MSDS Specification COA
NS6130-03-393 18282-10-5 MSDS pdf Specification pdf COA pdf

Tin Oxide Nanopowder (SnO2, F Doped, 99.9%, 80-100nm)

Tin Oxide Nanopowder

Tin Oxide Nanopowder (SnO2, F Doped, 99.9%, 80-100nm)

Quality Control: Each lot of Tin Oxide Nanopowder was tested successfully.

SEM-Tin Oxide Nanopowder

SEM-Tin Oxide Nanopowder

Particles Size of Analysis-SnO2

Particles Size of Analysis-SnO2

 
Product Tin Oxide Nanopowder
Stock No NS6130-03-393
CAS 18282-10-5 Confirm
APS 80-100nm Confirm
Purity 99.9% Confirm
HS Code 28419000 Confirm
Molecular Formula SnO2 Confirm
Molecular Weight 150.71g/mol Confirm
Melting Point 1630 °C Confirm
Boiling Point 1800-1900 °C Confirm
Density 6.95 g/cm³ Confirm
Form Powder Confirm
Color White Confirm
SSA 18.55 m²/g Confirm
Doping Fluorine Doped Confirm
Doping %age 2-3Wt% Confirm
Morphology Spherical Confirm
Solubility Insoluble in water
Main Inspect Verifier Manager QC

Typical Chemical Analysis

Assay 99.9%

Expert Reviews

Dr. Hans Roelofs Ph.D
Dr. Hans Roelofs Ph.D , (National Technical University of Athens, Greece)

Tin Oxide Nanopowder: Doping on nanomaterials provides a flexible way to tune to the properties of the materials while maintaining their high surface areas. The electronic, optical, photochemical, photo-electrochemical, photocatalytic and photoexcited relaxation properties can be tuned towards the desired direction by adding different elements. The materials can be engineered towards specific applications through careful selection of the dopants.


Dr. Ms. Yi Yen Shi
Dr. Ms. Yi Yen Shi, (King Mongkut’s University of Technology Thonburi,Bangkok, Thailand)

Tin Oxide Nanopowder: Doping is a powerful and effective way to alter the electronic and optical properties of a semiconductor. Doping is essential in the semiconductor industry since most semiconductors including silicon are essentially insulators without doping at room temperature. The addition of dopant can introduce electronic and structural defects into the pristine nanomaterials that can be advantageous or deleterious.


Dr. Huojin Chan
Dr. Huojin Chan , (University of Science and Technology of China, Hefei, Anhui, China)

Tin Oxide Nanopowder: Doping typically follows a Poisson distribution. The uniform doping is done either by growth or nucleation techniques by decoupling the doping and growth process. In nucleation doping reaction conditions are controlled in such a way along with judicious choice of reactants that a nucleus of dopant can be created and by shell growth of effectively confining the dopant to the center of particle.


Dr. Bruce Perrault, Ph.D
Dr. Bruce Perrault, Ph.D , (Georgia Institute of Technology (Georgia Tech), USA)

Tin Oxide Nanopowder: Nano-materials have been recently investigated due to their novel properties that are acquired at the nanometer scale, properties which change with size or shape. Besides the elemental composition and physical structure, as in bulk material or traditional chemistry, the size of the material provides another variable for us to tune the property of material. Moreover, a few dopants in the material can make the properties more adjustable.


Dr. Myron Rubenstein, Ph.D
Dr. Myron Rubenstein, Ph.D , (Polytechnic University of Turin, Italy)

Tin Oxide Nanopowder: Dopant precursor substantially changes the reaction kinetics. Doped semiconductor nanomaterials are expected to play an important role in nanoelectronics and nanophotonic devices. Doping level of nanostructures will effects the properties and functionality of nanoparticles. Doped semiconductor nanomaterials constitute a unique and important class of nanomaterials with novel properties.


Tin Oxide Nanopowder

Tin Oxide Nanopowder