Yttrium Aluminium Neodymium Doped (Y2.97Nd0.03Al5O12, Purity: 99%, >300nm)

Yttrium Aluminium Neodymium doped

Product: Yttrium Aluminium Neodymium doped (Y2.97Nd0.03Al5O12, Purity: 99%, >300nm)

Quality Control: Each lot of NANOSHEL Yttrium Aluminium Neodymium doped was tested successfully.

Yttrium Aluminium Neodymium Doped

SEM – Neodymium doped Yttrium Aluminate

Material Yttrium Aluminium Neodymium doped
Stock No NS6130-10-1099
CAS 12005-21-9 Confirm
APS >300nm Confirm
Purity 99% Confirm
Molecular Formula Y2.97Nd0.03Al5O12 Confirm
Molecular Weight 596.7g/mol Confirm
Crystal Structure Cubic Confirm
Density 4.55 g/cm³ Confirm
Melting Point 1970 °C Confirm
Hardness 8-8.5 Confirm
Weight of Nd 0.725% Confirm
Atoms of Nd per unit volume 1.38×1020 /cm³ Confirm
Charge state of Nd 3+ Confirm
Emission wavelength 1064 nm Confirm
Transition 4F3/2 → 4I11/2 Confirm
Duration of fluorescence 230 μs Confirm
Thermal Conductivity 0.14 W·cm−1·K−1 Confirm
Specific heat capacity 0.59 J·g−1·K−1 Confirm
Thermal expansion 6.9×10−6 K−1 Confirm
dn/dT 7.3×10−6 K−1 Confirm
Young’s modulus 3.17×104 K·g/mm−2 Confirm
Resistance to thermal shock 790 W·m−1 Confirm
Main Inspect Verifier Manager QC

Experts Review:

58496396Dr. Bruce Perrault, Ph.D (Georgia Institute of Technology (Georgia Tech), USA)
Doping on nanomaterials provides a flexible way to tune to the properties of the materials while maintaining their high surface areas. The electronic, optical, photochemical, photo-electrochemical, photocatalytic and photoexcited relaxation properties can be tuned towards the desired direction by adding different elements. The materials can be engineered towards specific applications through careful selection of the dopants.


1252525Dr. Myron Rubenstein, Ph.D (Polytechnic University of Turin, Italy)
Doping is a powerful and effective way to alter the electronic and optical properties of a semiconductor. Doping is essential in the semiconductor industry since most semiconductors including silicon are essentially insulators without doping at room temperature. The addition of dopant can introduce electronic and structural defects into the pristine nanomaterials that can be advantageous or deleterious.


2536582Dr. Huojin Chan (University of Science and Technology of China, Hefei, Anhui, China)
Doping typically follows a Poisson distribution. The uniform doping is done either by growth or nucleation techniques by decoupling the doping and growth process. In nucleation doping reaction conditions are controlled in such a way along with judicious choice of reactants that a nucleus of dopant can be created and by shell growth of effectively confining the dopant to the center of particle.


10604509_1459864657612760_2405225879143508610_oDr. Ms. Yi Yen Shi, (King Mongkut’s University of Technology Thonburi,Bangkok, Thailand)
Nano-materials have been recently investigated due to their novel properties that are acquired at the nanometer scale, properties which change with size or shape. Besides the elemental composition and physical structure, as in bulk material or traditional chemistry, the size of the material provides another variable for us to tune the property of material. Moreover, a few dopants in the material can make the properties more adjustable.


125448Dr. Hans Roelofs Ph.D (National Technical University of Athens, Greece)
Dopant precursor substantially changes the reaction kinetics. Doped semiconductor nanomaterials are expected to play an important role in nanoelectronics and nanophotonic devices. Doping level of nanostructures will effects the properties and functionality of nanoparticles. Doped semiconductor nanomaterials constitute a unique and important class of nanomaterials with novel properties.


Neodymium doped Yttrium Aluminate

Yttrium Aluminium Neodymium Doped


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