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Home » Yttrium Iron Oxide Nanoparticles (Y3Fe5O12, Purity: 99.9%, APS: 100nm)


Stock No. CAS MSDS Specification COA Catalogue
NS6130-12-001427 12063-56-8 MSDS pdf Specification pdf COA pdf

Yttrium Iron Oxide Nanoparticles

(Y3Fe5O12, Purity: 99.9%, APS: 100nm)

Available Pack Size: 10Gms, 25Gms, 50Gms, 100Gms, 250Gms, 500Gms, 1Kg & Bulk orders
Particles Size Analysis - Y3Fe5O12 Nanoparticles

Particles Size Analysis - Y3Fe5O12 Nanoparticles

Product Yttrium Iron Oxide Nanoparticles
Stock No NS6130-12-001427
CAS 12063-56-8 Confirm
Purity 99.9% Confirm
APS 100nm Confirm
Molecular Formula Y3Fe5O12 Confirm
Molecular Weight 737.94 g/mol Confirm
Form Powder Confirm
Color Green to brown Confirm
Density 5.11 g/cm³ Confirm
Melting Point >1040 °C Confirm
Concentration 0.5Wt% Confirm
Solubility Insoluble in water
Quality Control Each lot of Yttrium Iron Oxide Nanoparticles was tested successfully.
Main Inspect Verifier Manager QC

Typical Chemical Analysis

Assay 99.9 %
Other Metal 850ppm

Expert Reviews

Dr. Bruce Perrault, Ph.D , (Georgia Institute of Technology (Georgia Tech), USA)

Yttrium Iron Oxide Nanoparticles: Doping on nanomaterials provides a flexible way to tune to the properties of the materials while maintaining their high surface areas.The electronic, optical, photochemical, photo-electrochemical, photocatalytic and photoexcited relaxation properties can be tuned towards the desired direction by adding different elements.The materials can be engineered towards specific applications through careful selection of the dopants.

Dr. Myron Rubenstein, Ph.D , (Polytechnic University of Turin, Italy)

Yttrium Iron Oxide Nanoparticles: Doping is a powerful and effective way to alter the electronic and optical properties of a semiconductor. Doping is essential in the semiconductor industry since most semiconductors including silicon are essentially insulators without doping at room temperature. The addition of dopant can introduce electronic and structural defects into the pristine nanomaterials that can be advantageous or deleterious.

Dr. Huojin Chan , (University of Science and Technology of China, Hefei, Anhui, China)

Yttrium Iron Oxide Nanoparticles: Doping typically follows a Poisson distribution.The uniform doping is done either by growth or nucleation techniques by decoupling the doping and growth process. In nucleation doping reaction conditions are controlled in such a way along with judicious choice of reactants that a nucleus of dopant can be created and by shell growth of effectively confining the dopant to the center of particle.

Dr. Ms. Yi Yen Shi, (King Mongkut’s University of Technology Thonburi,Bangkok, Thailand)

Yttrium Iron Oxide Nanoparticles: Nano-materials have been recently investigated due to their novel properties that are acquired at the nanometer scale, properties which change with size or shape. Besides the elemental composition and physical structure, as in bulk material or traditional chemistry, the size of the material provides another variable for us to tune the property of material. Moreover, a few dopants in the material can make the properties more adjustable.

Dr. Hans Roelofs Ph.D , (National Technical University of Athens, Greece)

Yttrium Iron Oxide Nanoparticles: Dopant precursor substantially changes the reaction kinetics.Doped semiconductor nanomaterials are expected to play an important role in nanoelectronics and nanophotonic devices. Doping level of nanostructures will effects the properties and functionality of nanoparticles. Doped semiconductor nanomaterials constitute a unique and important class of nanomaterials with novel properties.

Yttrium Iron Oxide Nanoparticles

Yttrium Iron Oxide Nanoparticles

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