Yttrium Oxide Sputtering Target (Y2O3, Purity: 99.99%)

Sputtering Target

Product: Yttrium Oxide Sputtering Target (Y2O3, Purity: 99.99%)

Quality Control: Each lot of NANOSHEL Yttrium Oxide Sputtering Target was tested successfully.

Y2O3 Sputtering Target Image

Yttrium Oxide – Sputtering Target

Product Name Yttrium Oxide Sputtering Target
Product Code NS6130-10-1138
CAS 1314-36-9 Confirm
Diameter 50 mm ± 1mm Confirm
Thickness 3 mm ± 0.5mm Confirm
Purity >99.99% Confirm
Density 5.010 g/cm³ Confirm
Molecular Weight 225.81 g/mol Confirm
Melting Point 2425 °C Confirm
Loss on ignition 1.00 % Confirm
Shape Round Confirm
Size and Shape Targets Diameter and thickness can be according to Customer Requirement
Backing Plate Copper (as per customer requirement)
Conclusion The specifications Confirm with enterprise standard
Main Inspect Verifier Manager QC

Typical Chemical Analysis

La2O3 0.5 ppm
CeO2 0.5 ppm
Pr6O11 0.5 ppm
Nd2O3 0.5 ppm
Sm2O3 0.5 ppm
Eu2O3 0.5 ppm
Gd2O3 0.5 ppm
Tb4O7 0.5 ppm
Dy2O3 0.9 ppm
Ho2O3 0.7 ppm
Er2O3 0.5 ppm
Tm2O3 0.5 ppm
Yb2O3 0.8 ppm
Lu2O3 0.5 ppm
Fe2O3 2 ppm
SiO2 10 ppm
CaO 5 ppm
Cl- 100 ppm

Experts Review:

maslinDr. Jochen Maier, Ph.D (Canterbury Christ Church University, New Zealand)
Sputtering is a technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas. The gas use for sputtering is inert such as argon. For efficient momentum transfer projectile mass must match target mass, so for sputtering light elements neon is also used and for heavy elements krypton or xenon.


Website-profile-pics-033-3Dr. Ms. Suvi Ellilä, Ph.D (Halmstad University department of Research & technology, Sweden)
Reactive gases are used to sputter compounds. The chemical reaction can occur on the target surface, in-flight or on the substrate depending on the process parameters. The many parameters make sputter deposition a complex process but allow experts a large degree of control over the growth and microstructure of the film.


HermanCainProfilePicDr. Patrick Nilssen (Northern Private University Olivos, Peru)
Most sputtering target materials can be fabricated into a wide range of shapes and sizes. There are some technical limitations to the maximum size for a given single piece construction. In such cases, a multi-segmented target can be produced with the individual segments joined together by butt or beveled joints. Commonly used targets are circular or rectangular, although other shapes including square and triangular.


article-2738491-20EBB6E400000578-840_306x423Dr. Ms. Maryann Hine, Ph.D (Brewerville Institute of Technology,Liberia)
Nowadays applications of sputtering range from semiconductor industry for Thin Film deposition of various materials in integrated circuit processing, to architectural window glass for energy conservation, decorative with familiar gold-coloured hard coating created by Titanium Nitride and hardwearing coatings for tools and consumer goods, to deposition of metals during fabrication of CDs and DVDs.


CaptureDr. Peter Worcester (Murdoch University, Perth, Western Australia)
Sputter Deposition is a method of depositing thin films by sputtering that involves eroding materilas from a “ target” source onto a “substrate” e.g. silicon wafer. Sputtered atoms are ejected into the gas phase but are not in their thermodynamic equilibrium state, and tend to deposit on all surfaces in the vacuum chamber.


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Yttrium Oxide Sputtering Target

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Contact Us for Y2O3 Sputtering Target
From us, you can easily purchase nano materials at great prices. Place online order and we will dispatch your order through DHL, FedEx, UPS. You can also request for a quote by mailing us at sales@nanoshel.com Contact: +1 302 268 6163 (US and Europe), Contact: +91-9779550077 (India). We invite you to contact us for further information about our company and our capabilities. At Nanoshel, we could be glad to be of service to you. We look forward to your suggestions and feedback.


More Sputtering Targets By Nanoshel

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NS6130-10-1135 – Germanium Sputtering Target (Ge, Purity: 99.99%)

NS6130-10-1136 – Yttrium Sputtering Target (Y, Purity: 99.99%)

NS6130-10-1137 – Ruthenium Sputtering Target (Ru, Purity: 99.99%)

NS6130-10-1138 – Y2O3 Sputtering Target (Yttrium Oxide, Purity: 99.99%)

NS6130-10-1139 – Alumina Sputtering Target (Al2O3, Purity: 99.99%)

NS6130-10-1140 – Cerium Sputtering Target (Ce, Purity: 99.99%)

NS6130-10-1141 – Aluminium Oxide Sputtering Target (Al2O3, Purity: 99.99%)

NS6130-10-1142 – Magnesium Fluoride Sputtering Target (MgF2, Purity: 99.99%)

NS6130-10-1143 – Zinc Sulfide Sputtering Target (ZnS, Purity: 99.99%)