| Stock Number |
Product Name |
MSDS |
SPEC |
COA |
| NS6130-10-1151 |
Silver Sputtering Target (Ag, Purity: 99.99%) |
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| NS6130-10-1022 |
Zirconium Copper Aluminium Silver Alloy Sputtering Target (ZrCuAlAg, Purity: 99.99%) |
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| NS6130-10-1023 |
Titanium Copper Palladium Zirconium Alloy Sputtering Target (TiCuPdZr, Purity: 99.99%) |
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| NS6130-10-1024 |
OFE Copper Backing Plate 60mm |
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| NS6130-10-1025 |
Sputtering Target Metallic Bond ( Purity: 99.99%, Dia: 50 mm ± 1mm) |
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| NS6130-10-1027 |
Lead Zirconate Titanate Sputtering Target (PZT, Purity: 99.99%) |
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| NS6130-10-1028 |
Aluminium Silicon Sputtering Target (AlSi, Purity: 99.99%) |
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| NS6130-10-1029 |
Aluminum Nitride Sputtering Target (AlN, Purity: 99.99%) |
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| NS6130-10-1030 |
Antimony Sputtering Target (Sb, Purity: 99.99%) |
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| NS6130-10-1031 |
Rhodium Sputtering Target (Rh, Purity: 99.99%) |
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| NS6130-10-1032 |
Iron Sputtering Target (Fe, Purity: 99.99%) |
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| NS6130-10-1033 |
Gold Sputtering Target (Au, Purity: 99.99%) |
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| NS6130-10-1034 |
Platinum Sputtering Target (Pt, Purity: 99.99%) |
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| NS6130-10-1035 |
Beryllium Sputtering Target (Be, Purity: 99.99%) |
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| NS6130-10-1036 |
Boron Nitride Sputtering Target (BN, Purity: 99.99%) |
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| NS6130-10-1037 |
Boron Carbide Sputtering Target (B4C, Purity: 99.99%) |
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| NS6130-10-1038 |
Bismuth Sputtering Target (Bi, Purity: 99.99%) |
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| NS6130-10-1039 |
Calcium Fluoride Sputtering Target (CaF2, Purity: 99.99%) |
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| NS6130-10-1040 |
Lead Sputtering Target (Pb, Purity: 99.99%) |
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| NS6130-10-1041 |
Manganese Sputtering Target (Mn, Purity: 99.99%) |
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| NS6130-10-1042 |
Molybdenum Sputtering Target (Mo, Purity: 99.99%) |
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| NS6130-10-1043 |
Cobalt Oxide Sputtering Target (CoO, Purity: 99.99%) |
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| NS6130-10-1044 |
Palladium Sputtering Target (Pd, Purity: 99.99%, Dia: 50±1mm) |
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| NS6130-10-1045 |
Tungsten Sputtering Target (W, Purity: 99.99%, Dia: 50±1mm) |
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| NS6130-10-1046 |
Zirconium Sputtering Target (Zr, Purity: 99.99%, Dia: 50±1mm) |
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| NS6130-10-1047 |
Nickel Sputtering Target (Ni, Purity: 99.99%) |
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| NS6130-10-1048 |
Gallium Nitride Sputtering Target (GaN, Purity: 99.99%, 50 ± 1mm) |
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| NS6130-10-1049 |
Cobalt Iron Sputtering Target (CoFe, Purity: 99.99%, Dia: 50±1mm) |
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| NS6130-10-1050 |
Cadmium Sputtering Targets (Cd, Purity: 99.99%, Dia: 50±1mm) |
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| NS6130-10-1051 |
Constantan Resistance Alloy Sputtering Target (Purity: 99.99%) |
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| NS6130-10-1052 |
Titanium Sputtering Target (Ti, Purity: 99.99%) |
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| NS6130-10-1053 |
Chromium Sputtering Target (Cr, Purity: 99.99%, Dia: 50±1mm) |
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| NS6130-10-1054 |
Aluminium Sputtering Target (Al, Purity: 99.99%) |
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| NS6130-10-1055 |
Copper Sputtering Target (Cu, Purity: 99.99%, Dia: 50±1mm) |
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| NS6130-10-1056 |
Dysprosium Sputtering Target (Dy, Purity: 99.99%) |
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| NS6130-10-1057 |
Silicon Oxide Sputtering Target (SiO2, Purity: 99.99%, Dia: 50±1mm) |
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| NS6130-10-1058 |
Silicon Nitride Sputtering Target (Si3N4, Purity: 99.99%, Dia: 50±1mm) |
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| NS6130-10-1059 |
Cobalt Chromium Alloy Sputtering Target (Co3Cr, Purity: 99.99%) |
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| NS6130-10-1060 |
Titanium Oxide Sputtering Target (TiO2, Purity: 99.99%) |
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| NS6130-10-1061 |
Titanium Aluminium Vanadium Sputtering Target (TiAlV, Purity: 99.99%) |
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| NS6130-10-1065 |
Tin Sulfide Sputtering Target (SnS, Purity: 99.99%) |
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| NS6130-10-1066 |
Copper Sulfide Sputtering Target (CuS, Purity: 99.99%) |
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| NS6130-10-1130 |
Boron Sputtering Target (Bo, Purity: 99.99%) |
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| NS6130-10-1134 |
Silicon Sputtering Target (Si, Purity: 99.99%) |
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| NS6130-10-1135 |
Germanium Sputtering Target (Ge, Purity: 99.99%) |
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| NS6130-10-1136 |
Yttrium Sputtering Target (Y, Purity: 99.99%) |
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| NS6130-10-1137 |
Ruthenium Sputtering Target (Ru, Purity: 99.99%) |
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| NS6130-10-1138 |
Yttrium Oxide Sputtering Target (Y2O3, Purity: 99.99%) |
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| NS6130-10-1139 |
Alumina Sputtering Target (Al2O3, Purity: 99.99%) |
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| NS6130-10-1140 |
Cerium Sputtering Target (Ce, Purity: 99.99%) |
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| NS6130-10-1141 |
Aluminium Oxide Sputtering Target (Al2O3, Purity: 99.99%) |
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| NS6130-10-1142 |
Magnesium Fluoride Sputtering Target (MgF2, Purity: 99.99%) |
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| NS6130-10-1143 |
Zinc Sulfide Sputtering Target (ZnS, Purity: 99.99%) |
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| NS6130-10-1144 |
Ytterbium Fluoride Sputtering Target (YbF3, Purity: 99.99%) |
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| NS6130-10-1145 |
Zinc Selenide Sputtering Target (ZnSe, Purity: 99.99%) |
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| NS6130-10-1149 |
Stainless Steel Sputtering Target (SS, Purity: 99.99%) |
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| NS6130-10-1150 |
Carbon Sputtering Target (C, Purity: 99.99%) |
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| NS6130-10-1153 |
Hafnium Oxide Sputtering Target (HfO2, Purity: 99.99%) |
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| NS6130-10-1154 |
Hafnium Aluminium Oxide Sputtering Target (HfAlO2, Purity: 99.99%) |
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| NS6130-10-1155 |
Cobalt Sputtering Target (Baked With Indium Bonded, Purity: 99.99%) |
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| NS6130-10-1161 |
Gold Tin Sputtering Target (Au:Sn, Purity: 99.99%) |
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| NS6130-10-1176 |
Erbium Sputtering Target (Er, Purity: 99.99%) |
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| NS6130-10-1181 |
Europium Sputtering Target (Eu, Purity: 99.99%) |
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| NS6130-10-1182 |
Gadolinium Sputtering Target (Gd, Purity: 99.99%) |
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| NS6130-10-1187 |
Gold Palladium Sputtering Target (AuPd, Purity: 99.99%) |
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| NS6130-10-1188 |
Aluminium Chromium Alloy Sputtering Target (AlCr, Purity: 99.99%) |
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| NS6130-10-1190 |
Zinc Sputtering Target (Zn, Purity: 99.99%) |
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| NS6130-10-1191 |
Tin Sputtering Target (Sn, Purity: 99.99%) |
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| NS6130-10-1209 |
Indium Tin Oxide Sputtering Target (ITO, 99.99%) |
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| NS6130-10-1227 |
Titanium Diboride Sputtering Target (TiB2, Purity: 99.99%) |
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| NS6130-10-1277 |
Aluminium Oxinate Sputtering Target (C27H18AlN3O3, Diameter: 2", Thickness: 3mm) |
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| NS6130-10-1278 |
Triphenylamine Sputtering Target (C57H48N4, Diameter: 2?, Thickness: 3mm) |
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| NS6130-10-1279 |
Cobalt Iron Boron Sputtering Target (CoFeB, Purity: 99.99%, Dia: 50 mm, Thickness: 3 mm) |
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| NS6130-10-1280 |
Manganese Oxide Sputtering Target (MgO, Purity: 99.99%, Dia: 50mm, Thickness: 3mm) |
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| NS6130-10-1293 |
Magnesium Sputtering Target (Mg, Purity: 99.9%, Dia: 50mm, Thickness: 3mm) |
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| NS6130-10-1294 |
Magnesium Fluoride Sputtering Targets (MgF2, Purity: 99.9%, Dia: 50mm, Thickness: 3mm) |
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| NS6130-10-1295 |
Zinc Oxide Sputtering Target (ZnO, Purity: 99.99%, Dia: 50mm, Thickness: 3mm) |
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