Stock Number Product Name Specification
NS6130-10-1022 Zirconium Copper Aluminium Silver Alloy Sputtering Target (ZrCuAlAg, Purity: 99.99%)
NS6130-10-1023 Titanium Copper Palladium Zirconium Alloy Sputtering Target (TiCuPdZr, Purity: 99.99%)
NS6130-10-1024 OFE Copper Backing Plate 60mm
NS6130-10-1025 Sputtering Target Metallic Bond ( Purity: 99.9%, Dia: 50 mm ± 1mm)
NS6130-10-1027 Lead Zirconate Titanate Sputtering Target (PZT, Purity: 99.99%)
NS6130-10-1028 Aluminium Silicon Sputtering Target (AlSi, Purity: 99.99%)
NS6130-10-1029 Aluminum Nitride Sputtering Target (AlN, Purity: 99.99%)
NS6130-10-1030 Antimony Sputtering Target (Sb, Purity: 99.99%)
NS6130-10-1031 Rhodium Sputtering Target (Rh, Purity: 99.99%)
NS6130-10-1032 Iron Sputtering Target (Fe, Purity: 99.99%)
NS6130-10-1033 Gold Sputtering Target (Au, Purity: 99.99%)
NS6130-10-1034 Platinum Sputtering Target (Pt, Purity: 99.99%)
NS6130-10-1035 Beryllium Sputtering Target (Be, Purity: 99.99%)
NS6130-10-1036 Boron Nitride Sputtering Target (BN, Purity: 99.99%)
NS6130-10-1037 Boron Carbide Sputtering Target (B4C, Purity: 99.99%)
NS6130-10-1038 Bismuth Sputtering Target (Bi, Purity: 99.99%)
NS6130-10-1039 Calcium Fluoride Sputtering Target (CaF2, Purity: 99.99%)
NS6130-10-1040 Lead Sputtering Target (Pb, Purity: 99.99%)
NS6130-10-1041 Manganese Sputtering Target (Mn, Purity: 99.99%)
NS6130-10-1042 Molybdenum Sputtering Target (Mo, Purity: 99.99%)
NS6130-10-1043 Cobalt Oxide Sputtering Target (CoO, Purity: 99.99%)
NS6130-10-1044 Palladium Sputtering Target (Pd, Purity: 99.99%, Dia: 50±1mm)
NS6130-10-1045 Tungsten Sputtering Target (W, Purity: 99.99%, Dia: 50±1mm)
NS6130-10-1046 Zirconium Sputtering Target (Zr, Purity: 99.99%, Dia: 50±1mm)
NS6130-10-1047 Nickel Sputtering Target (Ni, Purity: 99.99%)
NS6130-10-1048 Gallium Nitride Sputtering Target (GaN, Purity: 99.99%, 50 ± 1mm)
NS6130-10-1049 Cobalt Iron Sputtering Target (CoFe, Purity: 99.99%, Dia: 50±1mm)
NS6130-10-1050 Cadmium Sputtering Targets (Cd, Purity: 99.99%, Dia: 50±1mm)
NS6130-10-1051 Constantan Resistance Alloy Sputtering Target (Purity: 99.99%)
NS6130-10-1052 Titanium Sputtering Target (Ti, Purity: 99.99%)
NS6130-10-1053 Chromium Sputtering Target (Cr, Purity: 99.99%, Dia: 50±1mm)
NS6130-10-1054 Aluminium Sputtering Target (Al, Purity: 99.99%)
NS6130-10-1055 Copper Sputtering Target (Cu, Purity: 99.99%, Dia: 50±1mm)
NS6130-10-1056 Dysprosium Sputtering Target (Dy, Purity: 99.99%)
NS6130-10-1057 Silicon Oxide Sputtering Target (SiO2, Purity: 99.99%, Dia: 50±1mm)
NS6130-10-1058 Silicon Nitride Sputtering Target (Si3N4, Purity: 99.99%, Dia: 50±1mm)
NS6130-10-1059 Cobalt Chromium Alloy Sputtering Target (Co3Cr, Purity: 99.99%)
NS6130-10-1060 Titanium Oxide Sputtering Target (TiO2, Purity: 99.99%)
NS6130-10-1061 Titanium Aluminium Vanadium Sputtering Target (TiAlV, Purity: 99.99%)
NS6130-10-1065 Tin Sulfide Sputtering Target (SnS, Purity: 99.99%)
NS6130-10-1066 Copper Sulfide Sputtering Target (CuS, Purity: 99.99%)
NS6130-10-1130 Boron Sputtering Target (Bo, Purity: 99.99%)
NS6130-10-1134 Silicon Sputtering Target (Si, Purity: 99.99%)
NS6130-10-1135 Germanium Sputtering Target (Ge, Purity: 99.99%)
NS6130-10-1136 Yttrium Sputtering Target (Y, Purity: 99.99%)
NS6130-10-1137 Ruthenium Sputtering Target (Ru, Purity: 99.99%)
NS6130-10-1138 Yttrium Oxide Sputtering Target (Y2O3, Purity: 99.99%)
NS6130-10-1139 Alumina Sputtering Target (Al2O3, Purity: 99.99%)
NS6130-10-1140 Cerium Sputtering Target (Ce, Purity: 99.99%)
NS6130-10-1141 Aluminium Oxide Sputtering Target (Al2O3, Purity: 99.99%)
NS6130-10-1142 Magnesium Fluoride Sputtering Target (MgF2, Purity: 99.99%)
NS6130-10-1143 Zinc Sulfide Sputtering Target (ZnS, Purity: 99.99%)
NS6130-10-1144 Ytterbium Fluoride Sputtering Target (YbF3, Purity: 99.99%)
NS6130-10-1145 Zinc Selenide Sputtering Target (ZnSe, Purity: 99.99%)
NS6130-10-1149 Stainless Steel Sputtering Target (SS, Purity: 99.99%)
NS6130-10-1150 Carbon Sputtering Target (C, Purity: 99.99%)
NS6130-10-1151 Silver Sputtering Target (Ag, Purity: 99.99%)
NS6130-10-1153 Hafnium Oxide Sputtering Target (HfO2, Purity: 99.99%)
NS6130-10-1154 Hafnium Aluminium Oxide Sputtering Target (HfAlO2, Purity: 99.99%)
NS6130-10-1155 Cobalt Sputtering Target (Baked With Indium Bonded, Purity: 99.99%)
NS6130-10-1161 Gold Tin Sputtering Target (Au:Sn, Purity: 99.99%)
NS6130-10-1176 Erbium Sputtering Target (Er, Purity: 99.99%)
NS6130-10-1181 Europium Sputtering Target (Eu, Purity: 99.99%)
NS6130-10-1182 Gadolinium Sputtering Target (Gd, Purity: 99.99%)
NS6130-10-1187 Gold Palladium Sputtering Target (AuPd, Purity: 99.99%)
NS6130-10-1188 Aluminium Chromium Alloy Sputtering Target (AlCr, Purity: 99.99%)
NS6130-10-1190 Zinc Sputtering Target (Zn, Purity: 99.99%)
NS6130-10-1191 Tin Sputtering Target (Sn, Purity: 99.99%)
NS6130-10-1209 Indium Tin Oxide Sputtering Target (ITO, 99.99%)
NS6130-10-1227 Titanium Diboride Sputtering Target (TiB2, Purity: 99.99%)
NS6130-10-1277 Aluminium Oxinate Sputtering Target (C27H18AlN3O3, Diameter: 2″, Thickness: 3mm)
NS6130-10-1278 Triphenylamine Sputtering Target (C57H48N4, Diameter: 2″, Thickness: 3mm)
NS6130-10-1279 Cobalt Iron Boron Sputtering Target (CoFeB, Purity: 99.99%, Dia: 50 mm, Thickness: 3 mm)
NS6130-10-1280 Manganese Oxide Sputtering Target (MgO, Purity: 99.99%, Dia: 50mm, Thickness: 3mm)
NS6130-10-1293 Magnesium Sputtering Target (Mg, Purity: 99.9%, Dia: 50mm, Thickness: 3mm)
NS6130-10-1294 Magnesium Fluoride Sputtering Targets (MgF2, Purity: 99.9%, Dia: 50mm, Thickness: 3mm)
NS6130-10-1295 Zinc Oxide Sputtering Target (ZnO, Purity: 99.5%, Dia: 50mm, Thickness: 3mm)