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Sputtering Targets

Stock No.
NS6130-10-1150
CAS
7440-44-0
MSDS
MSDS-PDF
Specifications
SPEC-PDF
COA
COA-PDF
Catalogue
MSDS pdf

Carbon Sputtering Target

(C, Purity: 99.99%, Dia: 50.8 mm)
Carbon Sputtering Target
Available Pack Size: 1Pc, 2Pcs, 5Pcs, 10Pcs & Bulk orders
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Preview
Carbon Sputtering Target
ProductCarbon Sputtering Target
Stock NoNS6130-10-1150
CAS7440-44-0Confirm
Purity 99.99%Confirm
Diameter 50.8 mm ± 1mmConfirm
Thickness 3 mm ± 0.5mmConfirm
Density 1.8 – 2.1 g/cm³Confirm
Shape RoundConfirm
Backing Plate Copper (as per customer requirement)
Size and Shape Targets Diameter and thickness can be according to Customer Requirement
ConclusionThe specifications Confirm with enterprise standard
Quality ControlEach Lot of was tested successfully
Main Inspect VerifierManager QC
Typical Chemical Analysis
Assay99.99%

Expert Reviews

product-expert-image
Dr. Jochen Maier Ph.D (Canterbury Christ Church University, New Zealand)

Carbon targets used for sputtering of carbon films generally consist of nearly pure graphite. The targets are electrically conductive. The target materials are readily available from many vendors world wide.

product-expert-image
Dr. Ms. Suvi Ellilä Ph.D (Halmstad University department of Research & technology, Sweden)

Carbon sputtering target was replaced after the de- positions of 20-30 films with several thousand A in thickness in mass-separated negative ion beam deposition system. Carbon films can also be deposited by magnetron sputtering in which a magnetically confined plasma torus  acts as a distributed source of ions that impact a carbon sputtering target over a significant part of its area. C -ions were produced from a highly pure carbon-sputtering target by cesium ion sputtering in a neutral and ionized alkaline bombardment-type heavy negative ion source.

product-expert-image
Dr. Patrick Nilssen (Northern Private University Olivos, Peru)

The applications for carbon are many and include its use as an alloying element with iron in the manufacture of steel, its use as brushes in electrical generators and motors, the use of colloidal graphite or carbon to coat surfaces (e.g. glass), in electrical assemblies to absorb microwaves and inhibit photoelectrons and secondary electrons, and the use of high purity carbon (graphite) in nuclear reactors to moderate neutrons.

nanoshel-experts

carbon sputtering target

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Carbon Sputtering Target (C, Purity: 99.99%, Dia: 50.8mm)

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