Titanium Silicon Oxide Nanoparticles: is a highly insoluble thermally stable Titanium source suitable for glass, optic and ceramic applications. The deposition of high-k titanium silicon oxide (TiSiO4) dielectric thin films by means of two different techniques, namely the pulsed laser deposition (PLD) and rf-magnetron sputtering. The bonding states and microstructure of the deposited films were characterized as a function of growth conditions. The electrical properties of the TiSiO4 films (including dielectric constant, dielectric loss, leakage current and breakdown voltage) were systematically determined through their integration into Pt/TiSiO4/Pt metal-insulator-metal devices. Deposition conditions that yield TiSiO4 thin films with excellent dielectric properties. These silicate films were found to exhibit a high-k value of ˜ 30, a dissipation factor as low as ˜ 0.01, and a leakage current lower than 10-6 A/cm^2 at 1 MV/cm.

Titanium Silicon Oxide Nanoparticles: Titanium Silicon Oxide Nanoparticles hierarchical coatings with various nanostructure morphologies prepared on titanium substrates through micro-arc oxidation (MAO) and subsequent hydrothermal treatment (HT). The nucleation mechanism and growth behavior of the nanostructures, hydrophilicity, protein adsorption and apatite-inducing ability of various coatings. The TiO2/silicate hierarchical coatings comprised calcium silicate hydrate (CSH) as an outer-layer and TiO2 matrix as an inner-layer. The nanostructures were classified as nanorod, nanoplate and nanoleaf.

Titanium Silicon Oxide Nanoparticles: Titanium Silicon Oxide Nanoparticles thin films have been successfully deposited radio-frequency magnetron sputtering of a TiO2/SiO2 composite target in a reactive gas atmosphere. The deposition of the films was investigated as a function of the [O2]/([Ar]+[O2]) flow ratio in the 0%-30% range. The bonding states and the dielectric properties of the sputter-deposited TiSixOy films were systematically investigated as a function of the O2 flow ratio. TiSixOy films exhibiting excellent dielectric properties (i.e., a dielectric constant as high as ~20, a dissipation factor as low as 0.01, and a low leakage current density of 10-3 A/cm2 at 1 MV/cm) were indeed achieved under high O2 flow ratio conditions (>=20%). In contrast, films deposited under low O2 flow ratio conditions (<=5%) have exhibited poor dielectric properties.

Titanium Silicon Oxide Nanoparticles: The nucleation of CSH nanostructures is caused by release and re-precipitation mechanism. The Titanium Silicon Oxide Nanoparticles hierarchical coatings exhibited some enhanced physical and biological performances compared to MAO-fabricated coating. The improvement of the hydrophilicity, fibronectin adsorption and apatite-inducing ability was found to be morphological dependent according to the following trend: nanoleaf coating > nanoplate coating > nanorod coating > MAO coating. The tuning of physical and morphological properties of nanostructures coated on biomaterial surface could significantly influence the hydrophilicity, protein adsorption and bioactivity of biomaterial.

Titanium Silicon Oxide Nanoparticles: A modern approach to classifying silicates is by their structure. This class of minerals uses SiO4 molecules connected as tetrahedrons. A tetrahedron is a triangular based pyramid. The oxygen atoms occupy the corners of the tetrahedron with the silicon atom in the center.The arrangement of this basic shape is the basis for classification. There are six subclasses. They are:NesoSilicates (Single Tetrahedrons), SoroSilicates (Double Tetrahedrons), InoSilicates( Single& Double Chains), CycloSilicates ( Rings), PhylloSilicates ( Sheets), TectoSilicates (Frameworks).