Aluminium Oxide Sputtering Target (Al2O3, Purity: 99.99%)

High Purity Sputtering Target

Product: Aluminium Oxide Sputtering Target (Al2O3, Purity: 99.99%)

Quality Control: Each lot of NANOSHEL Aluminium Oxide Sputtering Target was tested successfully.

Aluminium Oxide Sputtering Target

Aluminium Oxide – Sputtering Target

Product Name Aluminium Oxide Sputtering Target
Product Code NS6130-10-1141
CAS 1344-28-1 Confirm
Diameter 50 mm ± 1mm Confirm
Thickness 3 mm ± 0.5mm Confirm
Purity >99.99% Confirm
Density 3.95-4.1 g/cm³ Confirm
Molecular Weight 101.96 g/mol Confirm
Melting Point 2072 °C Confirm
Shape Round Confirm
Size and Shape Targets Diameter and thickness can be according to Customer Requirement
Backing Plate Copper (as per customer requirement)
Conclusion The specifications Confirm with enterprise standard
Main Inspect Verifier Manager QC

TYPICAL CHEMICAL ANALYSIS

Al2O3 99.9 % Confirm

Experts Review:


Dr. Clive Patterson Ph.D (Moscow Institute of Physics and Technology, Russia)
Aluminium Oxide Sputtering Target possesses very high electrical conductivity. molybdenum, it is used for metallization in thin-film transistors for TFT-LCD monitors, television sets and cell phone displays. aluminum sputtering targets are simply the best. Impurities in sputtering targets impair the conductivity of the material. aluminum is a particularly soft material. To make sure that the surfaces of our aluminum targets reach you in perfect condition, we take additional care during the machining and packaging of our products.


Dr. Ms. Teresa B. (University of San Carlos, Philippines)
Aluminium Oxide Sputtering Target is a technique used deposit thin films of a material onto a surface. There are many different ways to deposit materials such as metals , plastic and ceramics. Aluminum coating found on telescopes, automotive headlamps, mirrors, etc. it is widely used in the aerospace, automotive lighting, OLED etc.


Dr. Stew Dean Ph.D (University of Technology Sydney, Australia)
Aluminium Oxide Sputtering Target is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. Physical sputtering is driven by momentum exchange between the ions and atoms in the materials, due to collisions. The term electronic sputtering can mean either sputtering induced by energetic electrons or sputtering due to very high-energy or highly charged heavy ions that lose energy to the solid mostly by electronic stopping power.


Sputtering-Target copy

Aluminium Oxide Sputtering Target



Nanoshel’s Product Categories Link:

ZnSe/ZnS QDs WATER SOLUBLE, InP ZnS QDs SURFACE MODIFIED, CdS/ZnS QDs H2O SOLUBLE, PbS QDs SURFACE MODIFIED, ARSENIDES, LANTHANIDE NANOMATERIALS, TRANSITION METAL NANOMATERIALS, SPECIALITY CHEMICALS, MAGNETIC NANOPARTICLES, CUSTOM SYENTHESIS, METALIC FOAMS, SCREEN PRINTED BIO SENSOR, LITHIUM ION BATTERY MATERIAL, ITO COATED GLASS, POLYMERS NANO MATERIAL, NANO FABRIC COATINGS, METAL FOILS, PELLETS CHIPS METAL BALLS, WAFERS & TARGETS, SPUTTERING TARGETS, SINGLE CRYSTAL SUBSTRATES, PYROLITIC GRAPHITE, PROTECTIVE EQUIPMENTS, METAL CRUCIBLES, ALUMINA CERAMIC TILES, INORGANIC COMPOUNDS