Home » Aluminum Nitride Sputtering Target (AlN, Purity: 99.99%)


Stock No. CAS MSDS Specification COA
NS6130-10-1029 N/A MSDS pdf Specification pdf COA pdf

Aluminum Nitride Sputtering Target (AlN, Purity: 99.99%)

Aluminum Nitride Sputtering Target

Aluminum Nitride Sputtering Target (AlN, Purity: 99.99%)

Quality Control: Each lot of Aluminum Nitride Sputtering Target was tested successfully.

Aluminum Nitride Sputtering Target

Aluminum Nitride Sputtering Target

Product Aluminum Nitride Sputtering Target
Stock No NS6130-10-1029
Purity 99.99% Confirm
Diameter 50 mm ± 1mm Confirm
Thickness 3 mm ± 0.5mm Confirm
Shape Round Confirm
Size and Shape Targets Diameter and thickness can be according to Customer Requirement
Backing Plate Copper (as per customer requirement)
Conclusion The specifications Confirm with enterprise standard
Main Inspect Verifier Manager QC

Typical Chemical Analysis

Assay 99.99%

Expert Reviews

Dr. Jochen Maier, Ph.D (Canterbury Christ Church University, New Zealand)

Aluminum Nitride Sputtering Target  possesses very high electrical conductivity. molybdenum, it is used for metallization in thin-film transistors for TFT-LCD monitors, television sets and cell phone displays. aluminum sputtering targets are simply the best. Impurities in sputtering targets impair the conductivity of the material. aluminum is a particularly soft material. To make sure that the surfaces of our aluminum targets reach you in perfect condition, we take additional care during the machining and packaging of our products.

Dr. Ms. Suvi Ellilä, Ph.D (Halmstad University department of Research & technology, Sweden)

Aluminum Nitride Sputtering Target is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. Physical sputtering is driven by momentum exchange between the ions and atoms in the materials, due to collisions. The term electronic sputtering can mean either sputtering induced by energetic electrons or sputtering due to very high-energy or highly charged heavy ions that lose energy to the solid mostly by electronic stopping power.

Dr. Patrick Nilssen, (Northern Private University Olivos, Peru)

Aluminum Nitride Sputtering Target  is a technique used deposite thin films of a material onto a surface. There are many different ways to deposite materials such as metals , plastic and ceramics. Aluminum coating found on telescopes, automotive headlamps, mirrors, etc. it is widely used in the aerospace, automotive lighting,OLED etc.

Aluminum Nitride Sputtering Target

Aluminum Nitride Sputtering Target

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