Product | Aluminum Nitride Sputtering Target | |
Stock No | NS6130-10-1029 | |
Purity | 99.99% | Confirm |
Diameter | 50.8 mm ± 1mm | Confirm |
Thickness | 3 mm ± 0.5mm | Confirm |
Shape | Round | Confirm |
Backing Plate | Copper (as per customer requirement) | |
Size and Shape | Targets Diameter and thickness can be according to Customer Requirement | |
Conclusion | The specifications Confirm with enterprise standard | |
Quality Control | Each Lot of was tested successfully | |
Main Inspect Verifier | Manager QC |
Typical Chemical Analysis
Assay | 99.99% |
Aluminum Nitride Sputtering Target possesses very high electrical conductivity. molybdenum, it is used for metallization in thin-film transistors for TFT-LCD monitors, television sets and cell phone displays. aluminum sputtering targets are simply the best. Impurities in sputtering targets impair the conductivity of the material. aluminum is a particularly soft material. To make sure that the surfaces of our aluminum targets reach you in perfect condition, we take additional care during the machining and packaging of our products.
Aluminum Nitride Sputtering Target is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. Physical sputtering is driven by momentum exchange between the ions and atoms in the materials, due to collisions. The term electronic sputtering can mean either sputtering induced by energetic electrons or sputtering due to very high-energy or highly charged heavy ions that lose energy to the solid mostly by electronic stopping power.
Aluminum Nitride Sputtering Target is a technique used deposite thin films of a material onto a surface. There are many different ways to deposite materials such as metals , plastic and ceramics. Aluminum coating found on telescopes, automotive headlamps, mirrors, etc. it is widely used in the aerospace, automotive lighting,OLED etc.
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Aluminum Nitride Sputtering Target (AlN, Purity: 99.99%, Dia: 50.8mm)